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Wave Research Unveils UV Laser Ablation System Short Wavelength, Large Spot Size Significantly Improve Detection Limits Fremont, Calif., February 19, 2003 – New Wave Research introduces the UP266MACRO, a large-beam, 266-nm Nd:YAG laser ablation system specifically designed for ICP-OES and ICP-MS solid sampling analysis. Applications include bulk and inclusion analysis of metals; analysis of biological tissues, tree rings and gels; sulfate and sulfite analysis; and forensic analysis of plastics, ceramics, paint and glass. Featuring a large spot size and a short UV wavelength, the system can improve ICP-OES detection limits by more than 10 times. The UP266MACRO features 12 pre-calibrated spot sizes ranging from 30 µm to 750 µm. The system is VERI capable (Vernier Extended Range Increments), which allows users to increase the spot size range to 20 µm to 1100 µm. In addition, the UP266MACRO has sufficient energy density to effectively ablate glass, steel, noble metals, plastics, ceramics and biological matrices. The UP266MACRO increases the volume of sample aerosol without sacrificing analytical acuity or versatility. Providing the performance of a high-end 266-nm system with the benefit of a large volume of ablated material, the system increases ICP-OES detection limits by an order of magnitude. The UP266MACRO is compatible with all makes and sizes of ICP mass spectrometers equipped for micro-sampling and bulk analysis, including the latest instruments that feature lower detection limits and simultaneous signal detection. The system also includes the same, industry leading software platform found on all New Wave Research laser ablation systems, offering a wide variety of ablation methods such as spot ablation for depth profiling, line scanning for lateral analysis and raster scanning for bulk analysis. The software also provides control of X-Y stages, laser parameters and external triggering of sequential sampling, enhancing productivity and sample throughput. It is compatible with all the current Windows platforms (98, NT, 2000 and XP). The UP266MACRO will be on display at Pittcon booth #2954, March 10-13, in Orlando, Florida. Established in 1990, New
Wave Research endeavors to lead in the creation, development and manufacture
of high-quality, laser-based systems and modules for microelectronics
and analytical instrumentation applications. For more information, contact
Lawrence Neufeld, New Wave Research, 47613 Warm Springs Blvd., Fremont,
Calif., 94539; (603) 232-1983; e-mail: NWR_lasers@esi.com; Web: www.new-wave.com Contact: Richard Mauser
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