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Laser-Based Sapphire Wafer Scribing System Fremont, Calif., March 31, 2003 – New Wave Research has installed the first laser-based sapphire wafer scribing system in Japan. The installation of the company’s AccuScribe-SS40 scribing system was completed in mid-March 2003. “We are very proud to have installed an AccuScribe system in Japan,” said May Su, New Wave Research vice president of marketing. “This installation clearly demonstrates the shift by high-brightness LED manufacturers away from traditional diamond scribe technology toward laser-based equipment. It also further emphasizes our commitment to providing cost-effective laser-based solutions to the LED marketplace.” The AccuScribe-SS40 is the next generation of New Wave Research’s successful laser-based sapphire wafer scribing systems. With the release of the first AccuScribe-SS20 system in June 2002, LED-scribing costs were reduced by over 50% compared to traditional diamond scribe techniques. The new AccuScribe-SS40 features throughput of over 3 wafers per hour—further reducing scribe costs by nearly 30%. “Our AccuScribe instruments are a field-proven, cost-effective alternative to diamond scribing technology that now represent over 85% of the LED manufacturing market share,” said Su. “AccuScribe produces consistently clean, die singulation scribe lines at a uniform depth to result in superior die singulation yield for LED manufacturers. And the systems are easy to install, taking less than three hours to integrate into the production process.” The reduction in scribe cost over traditional diamond scribing technologies can be attributed to a number of factors. Primarily, while the hardness of sapphire causes diamond scribe tips to quickly degrade and demand constant maintenance, AccuScribe units require very little maintenance time. In addition, the accuracy and repeatability inherent in laser processing produces a consistently higher yield. The AccuScribe-SS40 processes 350 x 350µm dies on 50-mm wafers at a rate of over three wafers per hour. Channel depth is = 25 µm and channel width is = 8 µm, easily falling within a 40-µm street. In addition, the system features outstanding repeatability—over a run of 500 wafers, it maintains a scribe depth and width of ±10%. Ideal for the 24-hour, seven-day-per-week production environment, the AccuScribe-SS40 features a stable and robust design that allows for easy loading, unloading and alignment of wafers. It accommodates industry-standard blue film expansion frames, performs both full and partial wafer scribing and features an automatic edge detection capability. A positive pressure debris control system minimizes contamination on the wafer surface. A vacuum chuck maintains wafer flatness and ensures consistent laser focus and scribe depth during the operation. To further simplify the scribing process, New Wave Research also provides a user-friendly software package that controls all laser parameters, alignment, stage positioning, and displays real time images of the scribing process. Established in 1990, New Wave Research creates, develops, and manufactures high-quality, laser-based systems and modules for microelectronics and analytical instrumentation applications. For more information, contact May Su, New Wave Research, 47613 Warm Springs Blvd., Fremont, Calif., 94539; 510/249-1550, 510/249-1551 (fax); e-mail: NWR_lasers@esi.com; Web: www.new-wave.com Contact: Tracy Getz
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